Ferenc Mernyei, Franz Darrer, Matthijs Pardoen, and Andreas Sibrai
Abstract— This letter introduces a new method for reducing the substrate- related losses of integrated spiral inductors for radio frequency (RF) applications. Measurement based equivalent circuit parameters are demonstrated. Using our method the quality factor increased from 5.3 to 6.0 at 3.5 GHz at an 1.8- nH inductor.
Index Terms— Integrated inductor, on- chip spiral, quality factor, substrate loss.
INTRODUCTION
AT SILICON radio frequency (RF) integrated circuits, the usage of on- chip inductors in LC tanks is limited by the achievable quality factor. The modeling of such structures was carefully investigated [1], [2], and the source of losses were described as well [3], [4]. To find the optimal geometry, several “guidelines” were defined [2], [3] and optimizing algorithms were established in computer programs [5]. We can find the optimal line width for the highest possible quality factor for a given size and inductance value at a given frequency, but there have not been any suggestions published yet on how to reduce the substrate- related losses.
REDUCING THE SUBSTRATE LOSSES
By optimizing the spiral geometry, we will end up with a line width which will move the maximum of the curve to the desired frequency. In this case, the ohmic losses and the substrate capacitance will give us the minimal effective resistivity:
(1)
The substrate used to be considered a limiting factor that we could
not change, or that we had to remove [6]. Since the substrate losses
at the silicon substrates are related to its semiconductor nature we cannot
easily reduce them. The losses are caused by the eddy currents induced
by the magnetic filed of the spirals. The eddy currents are owing around
the axis of the spiral. If we can reduce the eddy currents, the quality
factor of the spirals will increase. With our BiCMOS technology, most of
the substrate currents ow in the top heavily doped p+ layer. This layer
can be broken by n+ regions. If we insert n+ regions (narrow stripes) perpendicular
to the eddy- current ow we create a blocking p- n- p junction. The layout
of the spiral with the eddycurrent blocking structure is shown on Fig.
1.
Fig. 1. Integrated spiral with eddy- current blocking structure.
Fig. 2. The compact model of an integrated spiral. against these currents.
MEASUREMENT RESULTS
To verify our idea we manufactured identical spirals with and without the blocking structure. We carried out S- parameter measurements on the spirals up to 6 GHz. By circuit optimization we extracted the parameters of the compact equivalent circuit (see Fig. 2). In Table I, the parameters of the spirals are summarized. Fig. 3 shows the quality factor of the spirals versus frequency, where we can see the improvement caused by the eddy- current blocking structure. We observed an increase from 5.3 to 6.0 at 3.5 GHz at an 1.8- nH inductor and from 4.3 to 4.8 at 2.2 GHz at an 2.8- nH inductor.
Fig. 3. Quality factor versus frequency at the measured inductors (see
Table I for spiral details).
TABLE I SPIRAL PARAMETERS
CONCLUSIONS
A new method was introduced to improve the quality factor of the integrated spiral inductors at silicon RF IC’s. The loss reduction is based on blocking the eddy currents in the semiconductive top p+ substrate layer with n+ stripes placed perpendicular to the eddy- current ow. The method was proved by measurements. With the described improvement our fully integrated voltage- controlled oscillator’s (VCO’s) phase noise performance became comparable with the ones having off- chip PCB resonators.
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